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The 4th ACM SIGGRAPH Conference and Exhibition on Computer Graphics and Interactive Techniques in Asia
 Conference 12-15 December • Exhibition 13-15 December • Hong Kong Convention & Exhibition Centre |
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Technical Papers
Material Editing
Wednesday, 14 December 09:00 -
10:45 |
Convention Hall B
Session Chair
Peter-Pike Sloan
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Material MattingWe present a user-guided algorithm for separating a complex spatially varying bidirectional reflectance distribution function (SVBRDF) into simpler layers with corresponding opacity maps (alpha mattes). This enables powerful edits that are not possible using existing systems. Daniel Lepage, University of Virginia |
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Physically-Based Interactive Bi-Scale Material DesignWe present the first physically-based interactive bi-scale material editing system to facilitate the appearance and design of different scales consistently, through manipulations of both small-scale geometry and materials. Hongzhi Wu, Yale University |
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AppGen: Interactive Material Modeling from a Single ImageInteractive system for modeling spatially-varying reflectance properties (diffuse, specular and roughness) and normal variations from a single image. Yue Dong, Tsinghua University |
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AppWarp: Retargeting Measured Materials by Appearance-Space WarpingAn algorithm for retargeting measured materials, where the spatially-varying reflectance of a source dataset is edited by applying the reflectance functions of a template measured material. Xiaobo An, Dartmouth College |
Sponsored by ACMSIGGRAPH